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Plasma processing
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#	Item
201	PyroGenesis Canada Inc. (TSXV: PYR) October 6, 2014 Highlights Cutting-edge technology: PyroGenesis is one of the largest plasma companies in the world, servicing Add to Reading List Source URL: www.pyrogenesis.com Language: English - Date: 2014-10-07 09:07:17 Sustainability Plasma physics Plasma processing Waste management Plasma arc waste disposal Plasma Waste-to-energy Waste Management Inc Incineration Technology Environment Thermal treatment
202	Microsoft Word - eNews_Man_010311.doc Add to Reading List Source URL: www.dsiac.org Language: English - Date: 2011-01-04 10:32:58 Sustainability Thermal treatment Waste Plasma physics Plasma processing Gasification Municipal solid waste Landfill Plasma Environment Waste management Technology
203	News Release Nanoplas Announces Important New 14nm Order and Joint Development Agreement with CEA-Leti High-selectivity dry-etch for 14nm OEM pilot line will replace wet etch; CEA-Leti to qualify the system for addition Add to Reading List Source URL: www-leti.cea.fr Language: English - Date: 2013-11-27 09:43:38 Technology Etching Plasma processing Microelectromechanical systems Transducers Dry etching Isotropic etching Plasma etching Wafer Semiconductor device fabrication Microtechnology Materials science
204	SiCl4/Cl2 plasmas: a new chemistry to etch high-k material selectively to Si-based alloys P. Bodarta, G. Cungea, C. Petit-Etiennea, M. Darnona, M. Haassa, S. Bannab, O.Jouberta and T.Lillb a CNRS-LTM, Add to Reading List Source URL: www-leti.cea.fr Language: English - Date: 2012-05-24 09:08:30 Plasma processing Technology Physics Etching Plasma CL2 Semiconductor device fabrication Materials science Microtechnology
205	FCH Review day[removed]smallinone[removed]Mode de compatibilité] Add to Reading List Source URL: www.fch-ju.eu Language: English - Date: 2014-09-28 16:54:22 Plasma processing Technology Physics Membrane technology Hydrogen technologies Chemical vapor deposition Plasma-enhanced chemical vapor deposition Nanoparticle Membrane electrode assembly Chemistry Thin film deposition Semiconductor device fabrication
206	SiCl4/Cl2 plasmas: a new chemistry to etch high-k material selectively to Si-based alloys P. Bodarta, G. Cungea, C. Petit-Etiennea, M. Darnona, M. Haassa, S. Bannab, O.Jouberta and T.Lillb a CNRS-LTM, Add to Reading List Source URL: www-leti.cea.fr Language: English - Date: 2012-05-24 09:08:30 Plasma processing Technology Physics Etching Plasma CL2 Semiconductor device fabrication Materials science Microtechnology
207	News Release Nanoplas Announces Important New 14nm Order and Joint Development Agreement with CEA-Leti High-selectivity dry-etch for 14nm OEM pilot line will replace wet etch; CEA-Leti to qualify the system for addition Add to Reading List Source URL: www-leti.cea.fr Language: English - Date: 2013-11-27 09:43:38 Technology Etching Plasma processing Microelectromechanical systems Transducers Dry etching Isotropic etching Plasma etching Wafer Semiconductor device fabrication Microtechnology Materials science
208	T ECH HIGHLIGH T S Improved Understanding of Parameters Contributing to Corrosion Resistance of Sputtered Al Thin Films Evaporated and sputter-deposited thin Add to Reading List Source URL: www.electrochem.org Language: English - Date: 2014-08-26 16:39:54 Coatings Thin films Plasma processing Thin film Chemical vapor deposition Corrosion Nafion Electrochemistry Atomic layer deposition Chemistry Thin film deposition Semiconductor device fabrication
209	Computer Chips new:Environment[removed] Add to Reading List Source URL: www.plasmacoalition.org Language: English - Date: 2006-08-29 00:35:20 Microtechnology Plasma processing Etching Plasma Microfabrication Wafer Isotropic etching Thin film Integrated circuit Semiconductor device fabrication Materials science Technology
210	Novel Bonding Methodologies Toward the Attainment of Primary Bonded Aircraft Structure Project WBS Number: [removed][removed]PI: Dr. John W. Connell, Advanced Materials and Processing Branch, NASA LaRC Co-I: Dr. Add to Reading List Source URL: nari.arc.nasa.gov Language: English - Date: 2014-10-17 18:20:41 Plasma physics Titanium Adhesive Laser Ablation Adhesion Coating Chemistry Physics Materials science

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